Your Professional Thin Film Equipment Supplier

 

Anhui Chunyuan Coating Technology Co., LTD., founded in 2014, is a state-level high-tech enterprise and provincial specialized new enterprise founded by the returned team from Singapore, and has grown into the only high-end pure ion coating equipment and nanocoating service industrialization leader in China.

Our company offers a wide range of PVD and CVD coating equipment, including multi-arc ion vacuum coating equipment series (pure ion coating), magnetron sputtering vacuum coating equipment series, and electron evaporation coating equipment series.

 
  • Arc Evaporation Thin Film System
    The Industrial Cathodic Arc Evaporation Thin Film System is engineered for the high-rate deposition of dense, strongly adherent metallic, alloy, and ceramic compound coatings. Operating via a...
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  • PVD Composite Vacuum Deposition Equipment
    This industrial PVD composite vacuum deposition platform integrates multiple deposition techniques into a single chamber environment to deposit uniform, multi-layer metallic, alloy, or dielectric...
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  • PVD Hybrid Thin Film Deposition System
    The PVD Hybrid Thin Film Deposition System integrates thermal evaporation, electron beam (e-beam) evaporation, and RF/DC magnetron sputtering within a single vacuum architecture. This platform...
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  • PVD Multi-Process Thin Film Equipment
    The PVD Multi-Process Thin Film Equipment is an integrated vacuum deposition platform engineered to combine multiple thin-film fabrication techniques—including RF/DC Magnetron Sputtering, Thermal...
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  • PVD Composite Deposition Equipment
    Industrial PVD Composite Deposition Equipment is engineered for multi-component, multi-layer, and nano-composite thin-film fabrication. The system integrates thermal evaporation, e-beam...
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  • PVD Composite Thin Film System
    Industrial-grade vacuum coating system integrating magnetron sputtering (RF/DC/HiPIMS) and cathodic arc evaporation. Designed for continuous, multi-layer, alloy, and nano-composite thin-film...
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  • PVD Composite Thin Film Equipment
    The PVD Composite Thin Film Equipment is an industrial vacuum platform designed to synthesize multi-layer, alloy, and graded thin films. Built on a modular 304L/316L stainless steel architecture,...
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  • Arc Evaporation PVD Equipment
    The industrial cathodic arc evaporation PVD system utilizes low-voltage, high-current electrical arcs to vaporize solid cathode targets in a vacuum environment. This mechanism achieves a metal...
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  • Vacuum Arc Thin Film System
    The Industrial Vacuum Arc Thin Film System utilizes cathodic arc evaporation to deposit dense, highly adherent metallic, alloy, and ceramic thin films. A high-current, low-voltage arc vaporizes...
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  • Cathodic Arc Thin Film Equipment
    Physical vapor deposition (PVD) system utilizing localized low-voltage, high-current electrical arcs to vaporize solid cathode targets into fully ionized plasma. The high ionization rate (40%-80%)...
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  • Arc Evaporation Deposition Equipment
    Industrial physical vapor deposition (PVD) platform engineered for high-rate synthesis of dense, wear-resistant, and functional hard coatings. Sustaining a high-current, low-voltage cathodic arc...
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  • Arc Evaporation Thin Film Equipment
    This cathodic arc evaporation system vaporizes solid cathode targets via a low-voltage, high-current electrical arc to generate fully ionized metal plasma. Compared to standard thermal evaporation...
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Why Choose us
 

large ecterprise scale

The company boasts an experienced team specializing in design, research and development (R&D), production, and market strategy, with mastery of core technologies.

Wide Application Of Technology

Our company boasts extensive production experience spanning multiple years. Adhering to a customer-centric approach and a win-win cooperation philosophy, we have cultivated a mature and robust operational framework.

standardized production

We provide 7x24-hour on-site consulting services, thoroughly understanding the detailed requirements of our customers and delivering customized equipment solutions to meet their specific production capacity needs.

 

 

Specification

 

 

Coating type

Depositiontemperature range

Microhardness(HV)

Coating binding power(N)

Maximum service temperature(°C)

Thickness(μm)

Super-hard ta-C

<150℃

4000-5500

≥35N

600°C

(under N2 protection)

1-2

Normal ta-C

<150℃

2000-4500

≥35N

350°C

2-4

Thick ta-C

<150℃

1800-2200

≥35N

350°C

5.5-8

Ultra-Thick ta-C

<150℃

1800-2200

≥35N

350°C

20-28

DLC

<120℃

1700-2500

≥30N

250°C

2-20

 

Types of Thin Film Equipment

 

 

The thin film equipment produced by our company mainly include the following types:

Plasma Enhanced Thin Film Equipment
Plasma enhanced thin film equipment is a pure ion coating technology (pure ion beam), high-energy ion beam cleaning technology (Ionbeam),Magnetron Sputter technology (Sputter) and Magnetic confinement vapor deposition (Magnetic confinement-CVD) are four technologies in one, which is a perfect fusion of PVD technology and CVD technology.

 

Optical Thin Film Equipment
Optical thin film equipment is specially designed for optical thin film device coating, equipped with low temperature trap auxiliary vacuum, equipped with excellent electron gun, and adopt IAD radio frequency ion assisted evaporation to form film.

 

Magnetron Sputtering Thin Film Equipment
Magnetron Sputtering Thin Film Equipment is using the company's mature core technology: high energy Ionbeam Cleaning + Magnetron Sputtering source (Magnetron Sputtering), the equipment adopts full automatic control, modular integrated optimization, equipment high power, stable performance, simple operation and easy maintenance.

 

Physical Vapor Deposition (PVD) Thin Film Equipment
This system integrates cutting-edge technologies such as magnetron sputtering, arc evaporation, and ion plating, and is equipped with an upgraded electromagnetic filtering system, enabling the controllable deposition of nano to micro-scale alloy, metal nitride, and composite films with excellent adhesion, uniformity, and density.

 

Plasma Enhanced Thin Film Equipment

 

Benefits of Thin Film Equipment

Magnetron Sputtering Thin Film Equipment has a unique core technology, specially designed magnetic field and process gas path, effectively improve the target utilization rate and long-term process stability;

Modular universal interface, directly compatible with different forms of cathode targets, allowing DC pulse, IF, RF working mode; Strong compatibility;

The self-designed automatic intelligent process operating system provides comprehensive and convenient process formula editing and calling capabilities, equipped with real-time process parameter monitoring system, allowing online remote control.

 

Application of Thin Film Equipment
 
 
 

Consumer electronics:

Smart phones, digital cameras, video recorders, projectors, telescopes, fax machines, photocopiers, glasses, etc.

 
 

In-vehicle display:

Consumer products in-vehicle display, in-vehicle camera, control panel, etc.;

 
 

LED display:

Lndustrial applications LED, LCD, organic EL, DVD, CDRW, CDR, CD and other optical pickup,Solar cells, decorative parts, electronic parts, etc.;

 
 

Electronic components:

Electronic components industry equipment lenses, optical components, lasers, optical switch components, etc.

 

 

Delivery Information

 
 
01
 

Shipping Methods:

We offer a variety of shipping options, including sea freight, air freight, railway transportation, and international express delivery, to meet the diverse needs of our customers.

 
02
 

Estimated Delivery Time:

We will provide you with the estimated delivery time for your order, which will be clearly stated in the formal order to ensure your rights are protected, allowing you to arrange for the receipt of your goods in a timely manner.

 
03
 

Order Tracking:

We provide order tracking services, allowing you to stay informed about the current status and expected arrival time of your order. Detailed inspection information and shipping manifests, including photos and videos, are provided to ensure the security of your transactions.

光学薄膜设备

 

 

FAQ

 

 

Q: What is an optical film?

A: 1 Definition of optical films. Optical films, also known as optical thin films or optical layers, are attached to a substrate and differ from the substrate in the ability to tailor the transmission, reflection, or absorption spectral properties of the light.

Q: Why magnetron sputtering?

A: Magnetron sputtering is a process used for depositing high-quality functional films in various industrial applications, such as hard coatings, low friction coatings, corrosion-resistant coatings, and coatings with specific optical or electrical properties.

Q: What is RF magnetron sputtering of thin films?

A: RF Magnetron sputtering technique is used for deposited ZnO films on two substrates (Si(100) and glass) at different powers. Preferred orientation ZnO films was obtained in using XRD measurements. SEM and AFM confirmed the ZnO film in optimize conditions had nanostructure growth and smooth.

Q: Is magnetron sputtering PVD or CVD?

A: Magnetron sputtering is a plasma-based technique for physical vapor deposition (or PVD) coating that creates dense films with good adhesion.

We're well-known as one of the leading thin film equipment manufacturers and suppliers in China. If you're going to buy customized thin film equipment made in China, welcome to get pricelist from our factory. For price consultation, contact us.

thin film equipment for sensor applications, thin film equipment for optical applications, thin film processing system
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