Product Overview

 

The Industrial Cathodic Arc Evaporation System is a production-grade physical vapor deposition (PVD) platform engineered for depositing wear-resistant, corrosion-resistant, and low-friction hard coatings. By employing low-voltage, high-current electrical arcs, solid cathode targets are vaporized and ionized instantly at the cathode spot, generating highly ionized metal plasma.


Designed and manufactured under ISO 9001 quality management standards and CE compliance directives, this system is configured for high-throughput coating operations in tool manufacturing, automotive components, and industrial hardware sectors. Standard configurations integrate multi-cathode layouts with independent magnetic-field steering, programmable DC/pulsed bias power supplies, and automated vacuum control to maintain consistent film stoichiometry and dense microstructures.

 
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Technical Specifications

 

Parameter

Specification Range / Standard Configuration

Chamber Dimensions

Diameter: 800 mm - 1800 mm (Customizable vertical/horizontal layouts)

Chamber Material

Double-walled SUS304 stainless steel with internal water-cooling channels

Ultimate Vacuum Pressure

<= 5.0 x 10^-4 Pa (Achieved via roots blower and molecular/oil diffusion pump groups)

Cathode Configuration

4 to 12 rectangular/circular arc sources with electromagnetic steering

Arc Power Supply

300A - 500A adjustable constant current, ripple <= 2%

Substrate Bias Power

0 to -1000V adjustable, pulsed bias frequency 10 kHz - 100 kHz

Heating System

Radiant heater array, max temperature 600°C +/- 5°C uniformity

Workpiece Rotation

Planetary or dual-axis rotation driven by magnetic fluid feedthrough

Control System

PLC + Industrial PC, recipe-driven automated sequence control

Utility Requirements

Cooling water: 0.25-0.35 MPa, 20-25°C; Power: 380V/480V, 3-phase, 50/60 Hz

 

Arc Evaporation Process

The deposition cycle operates under strict procedural control to guarantee film integrity and interface adhesion:

Evacuation & Outgassing:

The vacuum chamber is pumped down to the base pressure. Substrates are heated under vacuum to eliminate surface volatiles and residual moisture.

01

Plasma Etching (Cleaning):

Metal ion bombardment (using titanium or chromium target sources) cleans the substrate surface at an atomic level, removing native oxides and activating the interface.

02

Reactive Deposition:

Reactive gases (N2, CH4, O2) are injected into the chamber through mass flow controllers (MFCs) to react with the metal plasma flux (e.g., Ti, Cr, AlTi), forming compound films such as TiN, TiAlN, or CrN.

03

Cooling & Venting:

Post-deposition cooling occurs under protective inert gas atmosphere before chamber venting and part retrieval.

04

 

Arc Evaporation Thin Film Equipment

 

Film Materials & Substrates

Supported Cathode Targets
Titanium (Ti) & Titanium Aluminum (TiAl): Base materials for standard TiN and high-oxidation-resistance TiAlN coatings (withstanding oxidation up to 900°C).


Chromium (Cr): Used for decorative finishes and corrosion-resistant CrN/CrC layers.


Zirconium (Zr) & Titanium Silicon (TiSi): Applied for specialized decorative and extreme wear-resistant nanocomposite films.


Compatible Substrate Materials
High-Speed Steel (HSS): Twist drills, end mills, hobs, and broaches.


Cemented Carbides (WC-Co): Indexable inserts, reamers, and forming dies.


Engineering Steels & Alloys: Automotive valve components, gears, stainless steel sanitary hardware, and titanium medical implants.

 

Applications & Performance Impact

Metal Cutting Tools:

Deposition of TiAlN and AlCrN coatings on carbide inserts and end mills, extending tool lifespan by 200% to 300% and enabling dry high-speed machining.

Forming & Stamping Dies:

Application of dense, low-friction coatings to reduce adhesive wear, galling, and workpiece sticking during deep drawing, reducing downtime by up to 40%.

Automotive Powertrain:

Treatment of piston rings, fuel injection pins, and tappets to minimize boundary friction coefficient down to < 0.15 and prevent scuffing wear.

Industrial Hardware & Sanitary Faucet:

Hard decorative PVD layers (TiN gold, rose gold, black zirconium) passing a minimum 500-hour neutral salt spray test (ASTM B117).

 

Customization & Process Configuration

Equipment layouts scale according to production volume, part geometry, and factory footprint:

Chamber Geometry:

Vertical loading structures for heavy tools; horizontal batch configurations for high-capacity fixture loading.

Source Integration:

Hybrid configurations combining cathodic arc sources with unbalanced magnetron sputtering (RMS) cathodes to deposit smooth, droplet-free multilayer architectures.

Filtration Systems:

Optional magnetic macroparticle filters (steered arc filters) installed on cathode channels to eliminate macro-droplets for optical or ultra-smooth precision functional coatings.

Automation Interface:

Integration-ready for robotic loading arms and automated guided vehicle (AGV) batch staging.

 

 

Manufacturing & Quality Control

Structural Integrity: Chamber bodies undergo Helium mass spectrometer leak testing at a sensitivity threshold of <= 1 x 10^-9 Pa*m3/s prior to assembly.


Electrical Safety & Compliance: Built strictly to CE and IEC electrical safety guidelines, featuring full insulation testing and emergency safety interlocks.


Functional Run-off (FAT): Each system undergoes a 72-hour continuous dry-run test and a full-process thermal deposition test in our factory. Coating thickness uniformity (+/- 5%) and adhesion (Scratch Tester critical load Lc >= 40 N / Rockwell indentation HF1-HF2) are verified on standard test coupons before shipment.

Cathodic Arc Thin Film Equipment

 

Installation & Technical Support
 

Site Preparation Package:

Comprehensive utility layout drawings detailing cooling water flow rates, exhaust ventilation, floor load capacity, and electrical drop specifications provided 4 weeks post-contract.

On-Site Commissioning:

Factory-certified process engineers handle mechanical alignment, vacuum leak detection, electrical integration, and initial baseline recipe setup at the client facility.

Process Recipe Transfer:

Delivery includes standard baseline recipes (TiN, TiAlN, CrN) and operational training for internal maintenance and engineering teams.

Remote Diagnostic Support:

Systems equipped with secure industrial router gateways for remote parameter troubleshooting and PLC logic diagnostics.

 

 

FAQ

 

 

Q: How does the system control macroparticle (droplet) generation inherent to arc evaporation?

A: The equipment utilizes adjustable magnetic field steering coils to move the cathode arc spot rapidly across the target surface, reducing residence time and droplet ejection. For applications requiring ultra-smooth finishes, optional filtered arc modules magnetically deflect the metal plasma away from macroparticles before reaching the substrate.

Q: What is the typical target utilization rate for the standard cathode configuration?

A: Standard circular and rectangular cathodes achieve a target material utilization rate of 40% to 55%, depending on the magnetic field profile and target thickness. Target replacement is mechanically secured with quick-clamp mechanisms to minimize maintenance downtime.

Q: Can this equipment be integrated into an existing automated production line?

A: Yes. The PLC control architecture supports SECS/GEM communication protocols and standard digital I/O handshaking for integration with automated pre-cleaning lines and robotic loading cells.

Q: What is the standard lead time for a custom chamber configuration?

A: Standard vertical batch systems require 16 to 22 weeks from drawing approval to factory acceptance testing (FAT), depending on customized pumping group specifications and power supply arrangements.

We're well-known as one of the leading arc evaporation thin film equipment manufacturers and suppliers in China. If you're going to buy customized arc evaporation thin film equipment made in China, welcome to get pricelist from our factory. For price consultation, contact us.

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