Your Professional Ion Etching Equipment Supplier
Anhui Chunyuan Coating Technology Co., LTD., founded in 2014, is a state-level high-tech enterprise and provincial specialized new enterprise founded by the returned team from Singapore, and has grown into the only high-end pure ion coating equipment and nanocoating service industrialization leader in China.
Our company offers a wide range of PVD and CVD coating equipment, including multi-arc ion vacuum coating equipment series (pure ion coating), magnetron sputtering vacuum coating equipment series, and electron evaporation coating equipment series.
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![Thin Film Etching Equipment]()
Thin Film Etching Equipment1. Equipment Description: ·Equipment introduction: 》 The process gas molecules passing through the etching chamber decompose and ionize to produce plasma. 》 Some of the active groups in the...view more -
![Plasma Etching Thin Film Equipment]()
Plasma Etching Thin Film EquipmentPlasma Etching Thin Film Equipment is a cutting-edge solution designed for precision stripping of thin-film coatings, offering exceptional performance in surface modification and residue removal....view more -
![Dry Etching Equipment]()
Dry Etching EquipmentDry Etching Equipment is a high-performance solution for precision material processing across diverse industries. Utilizing advanced reactive ion etching (RIE) technology, this equipment achieves...view more -
![Plasma Cleaning Machine]()
Plasma Cleaning MachinePlasma Cleaning Machine is a versatile solution for removing organic contaminants, oxides, and microscopic residues from material surfaces. By leveraging low-temperature plasma technology, it...view more
Why Choose us
large ecterprise scale
The company boasts an experienced team specializing in design, research and development (R&D), production, and market strategy, with mastery of core technologies.
Wide Application Of Technology
Our company boasts extensive production experience spanning multiple years. Adhering to a customer-centric approach and a win-win cooperation philosophy, we have cultivated a mature and robust operational framework.
standardized production
We provide 7x24-hour on-site consulting services, thoroughly understanding the detailed requirements of our customers and delivering customized equipment solutions to meet their specific production capacity needs.
Parameter
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Etching Gas: |
Ar, O₂ |
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Power Supply: |
380V/50Hz, 10 kW |
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Vacuum System: |
Molecular pump with base pressure ≤5.0×10⁻⁴ Pa |
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Customization: |
Chamber size and external dimensions can be tailored to client needs. |
Benefits of Ion Etching Equipment
Low-temperature processing:
The ion etching equipment operates at ultra-low temperatures, minimizing thermal stress and preventing substrate deformation. This feature is critical for delicate materials such as polymers and precision optics.
Adjustable etching rate:
The distance between the ion source and substrate can be dynamically adjusted via a height-adjustable rotating platform, enabling precise control over etching speed (up to 30 nm/min) to meet diverse process requirements.
High uniformity:
Equipped with patented ion beam sources and advanced discharge technology, the equipment generates high-density plasma, ensuring uniform etching and consistent results across substrates up to 800 mm in diameter.
Dual-functionality:
Beyond film removal, this system can be customized for multifunctional applications, including surface cleaning and pre-treatment for subsequent coating processes.
A ion etching equipment is a device that uses plasma to etch or remove material from a polymer substrate, oxide, metal, glass or ceramic. Plasma is a highly ionized gas that can be used to clean, etch, and deposit materials on surfaces.
Chemical etching is the process of using chemicals to remove material from a substrate. Chemical etching is often used to remove metals from printed circuit boards (PCBs) and other electronic components. It can also be used to create patterns and shapes on metal surfaces. Photo Chemical etching is a versatile manufacturing process that offers many advantages over traditional machining methods.
Plasma etching is a more precise and controlled process than chemical etching. Plasma etching can be used to remove very thin films of material, making it ideal for applications where high accuracy is required.
Both plasma etching and chemical etching have their advantages and disadvantages. The best process for a particular application depends on the project's requirements.
Shipping and Payment Terms
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Terms Of Payment |
We usually accept T/T, L/C, Paypal, Credit card, etc. If you prefer other payments terms, please feel free to discuss with us. |
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Shipping |
We offer various shipping methods, including sea freight, air freight, and express delivery, depending on the order size and destination. |
FAQ
We're well-known as one of the leading ion etching equipment manufacturers and suppliers in China. If you're going to buy customized ion etching equipment made in China, welcome to get pricelist from our factory. For price consultation, contact us.
Thin Film Etching Equipment, Dry Etching Equipment
