Physical Vapor Deposition (PVD) Thin Film Equipment

Physical Vapor Deposition (PVD) Thin Film Equipment

Details
Anhui Chunyuan Coating Technology Co., Ltd. specializes in the research and development of advanced Physical Vapor Deposition (PVD) Thin Film Equipment, providing high-performance coating solutions for industrial applications. This system integrates cutting-edge technologies such as magnetron sputtering, arc evaporation, and ion plating, and is equipped with an upgraded electromagnetic filtering system, enabling the controllable deposition of nano to micro-scale alloy, metal nitride, and composite films with excellent adhesion, uniformity, and density.
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Thin Film Equipment
 
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Anhui Chunyuan Coating Technology Co., Ltd. specializes in the research and development of advanced Physical Vapor Deposition (PVD) Thin Film Equipment, providing high-performance coating solutions for industrial applications. This system integrates cutting-edge technologies such as magnetron sputtering, arc evaporation, and ion plating, and is equipped with an upgraded electromagnetic filtering system, enabling the controllable deposition of nano to micro-scale alloy, metal nitride, and composite films with excellent adhesion, uniformity, and density.

 

Core technological breakthroughs include the electromagnetic filtering system and electromagnetic scanning system, combined with plasma-enhanced reactive deposition technology, which can filter out neutral particles, large particle ion clusters and other impurities, significantly improving the purity of the plasma beam, and preparing dense and uniform nano-films, making the film layer harder, with better wear resistance and corrosion resistance.

 

The equipment adopts a modular vacuum chamber design, equipped with multi-arc target combinations and high-density plasma sources (HDPs), with a maximum deposition rate of up to 5 microns per minute, and the substrate temperature can be controlled below 200°C.

 

In addition, it also adopts Chunyuan's independently developed hybrid PVD mode and reactive gas ionization enhancement system, so compared with traditional equipment, the coating hardness is increased to HV3500, and the defect density is reduced by 60%. The system supports more than 40 kinds of coating materials such as AlCrN, TiSiCN, and ZrO₂-Al₂O₃ nano-composite materials, with the highest hardness reaching 45GPa and a temperature resistance exceeding 800°C. It is equipped with an Industry 4.0 interface and can achieve remote parameter optimization through AI-driven deposition models.

 

This equipment is currently widely used in precision parts, microelectronics, automotive parts, consumer electronics, and decorative coating fields. The core component localization rate reaches 85%, and the energy consumption is 30% lower than that of similar products in the EU, marking a major breakthrough in China's high-end coating equipment field.

 

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