Magnetron Sputter Coating Equipment

Magnetron sputtering coating machine is a physical vapor deposition technology that uses magnetic field and ion interaction to prepare thin films. The Magnetron Sputtering coating machine uses the company's proven core technology: Ionbeam Cleaning + Magnetron sputtering source. In the vacuum chamber, the environment reaches a high vacuum state by vacuuming. Then, by means of glow discharge or radio frequency radiation, the target surface is activated to ionize the working gas atoms or molecules and form a plasma. Then, by applying a magnetic field, the ions are controlled by the magnetic field, increasing the probability of hitting the surface of the target. The ion beam collides with the surface of the target, causing the atoms or molecules on the target to sputter and deposit on the substrate surface at a higher speed to form a film. The energy of the ion beam can be adjusted, and the structure and properties of the film can be changed by controlling the ion beam energy and density. The magnetron sputtering coating machine adopts full automatic control, modular integration optimization, high power, good stability, simple operation and easy maintenance. The magnetron sputtering machine is suitable for coating development and batch coating services.

》Fast deposition speed;

》Low substrate temperature rise;

》The damage to the membrane layer is small;

》Good membrane bonding;

》High film purity, good density, good film uniformity;

》Good repeatability;

》Suitable for a variety of materials;

》Easy to realize industrialization;

》The composition of the film layer is close to that of the target material.

》The film coating is good;

》Negative bias is applied to the workpiece;

》Composite target technique.